Self-organized nanotemplating on misfit dislocation networks investigated by scanning tunneling microscopy
Abstract
Self-ordering growth of nanoarrays on strained metallic interfaces is an attractive option for preparing highly ordered nanotemplates. The great potential of this natural templating approach is that symmetry, feature sizes, and density are predicted to depend on the interfacial stress in these strained layers, which can be adjusted by changing the substrate-thin film composition, temperature, and adlayer coverage. This bottom-up approach of growing nanostructured twodimensional ordered arrays of clusters on the misfit dislocation networks of strained metallic thin films and surfaces requires a detailed understanding of the nucleation and film-adsorbate interaction processes. Here we show how high resolution, large scale, variable temperature scanning tunneling microscopy imaging can improve our understanding of these self-assembly processes.
Department
Physics
Publication Date
5-4-2007
Journal Title
Microscopy research and technique
Publisher
WILEY-LISS
Digital Object Identifier (DOI)
10.1002/jemt.20479
Document Type
Article
Recommended Citation
Diaconescu, Bogdan; Nenchev, Georgi; Jones, Joshua; and Pohl, Karsten, "Self-organized nanotemplating on misfit dislocation networks investigated by scanning tunneling microscopy" (2007). Microscopy research and technique. 93.
https://scholars.unh.edu/physics_facpub/93
Rights
© 2007 Wiley-Liss, Inc.