Point Defect Trapping at 111In in Copper after Ion Implantation

Authors

Olof Echt, University of New HampshireFollow
Ekkehard Recknagel, Universität Konstanz
A. Weidinger, Universität Konstanz
Th. Wichert, Universität Konstanz

Department

Physics

Publication Date

1-1-1978

Journal Title

Hyperfine Interactions

Publisher

Springer

Digital Object Identifier (DOI)

https://dx.doi.org/10.1007/BF01021917

Document Type

Article

Recommended Citation

O. Echt, E. Recknagel, A. Weidinger and Th. Wichert, Point Defect Trapping at 111In in Copper after Ion Implantation, Hyperfine Interactions 4 (1978) 706