Multi-resolution quality improvement for patch-based texture synthesis in wavelet domain
Patch-based texture synthesis has been widely used in computer graphics and computer vision due to simplicity and efficiency. The basic idea is to add one patch of the sample texture at a time to the target texture. Much work has been done to minimize the appearance of seams in the overlap region of two adjacent patches. Among various approaches to blending, stitching two patches along the minimum error boundary cut is considered to be one of the most efficient. However, in real textures, especially the semi-stochastic ones, perfect cuts do not exist; therefore, the defects due to the inconsistency between the patches become an important problem for the synthesized texture quality. In our paper, two novel models that have not been considered in the previous approaches are proposed to overcome these difficulties. We show that the texture quality can be improved by performing multi-resolution operations on the overlap region of adjacent patches in the wavelet domain.
Journal or Conference Title
International Association of Science and Technology for Development (IASTED)
Aug 14 - Aug 16, 2006
Honolulu, HI, USA
Rzhanov, Yuri; Gu, Fan; and Hausner, Alejo, "Multi-resolution quality improvement for patch-based texture synthesis in wavelet domain" (2006). International Association of Science and Technology for Development (IASTED). 375.